What's New

04 Feb 17: Theshold Switching Behavior

04 Feb 09: Micro-Liquid Deposition FRDPARRC Idea Development

Relevant Fab Experience

  • Lithography Processing
  • Wet Bench Work
  • PECVD
  • RIE
  • E-beam Deposition
  • RF Sputtering
  • MBE Growth
  • Oxidation
  • SEM Microscopy

Prior Shop/Lab Certifications

  • Basic Chemical Hygiene
  • MTL User Lab Training
  • Hazardous Waste Management Training
  • HF Training

Interest in Taking the Class

I look to benefit from the collective knowledge pooled together from the various disciplines involved with this course. This garnered brain trust will then help me to think more creatively, logically, and on a holistic scope when I undertake current and future project.

Institutional Status

PhD Graduate Student

Research

Molecular Beam Epitaxy III-V Materials & Photonic Device

 

MEMS Coupled Charge-Gap Lumped Dynamic Modeling of a 1D Cantilever

Stephen D. Senturia, Microsystem Design. Kluwer Academic Publishers. Boston. 2001

 

Parameter

Symbol

Value

Area

A

100

Permittivity

e

1

Initial Gap

go

1

Minimum Gap

gmin

.01

Mass

m

1

Damping Constant

b

0.5

Spring Constant

k

1

Resistance

R

.001

Input Signal
Charge
Velocity
Position

 

 

Position vs. Charge
Velocity vs. Position