What's
New
|
04 Feb 17: Theshold
Switching Behavior
04 Feb 09:
Micro-Liquid Deposition FRDPARRC Idea
Development
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|
Relevant Fab
Experience
|
- Lithography
Processing
- Wet Bench
Work
- PECVD
- RIE
- E-beam
Deposition
- RF
Sputtering
- MBE
Growth
- Oxidation
- SEM Microscopy
|
|
Prior Shop/Lab
Certifications
|
- Basic
Chemical Hygiene
- MTL
User Lab Training
- Hazardous
Waste Management Training
- HF
Training
|
|
Interest in
Taking the Class
|
I look
to benefit from the collective knowledge
pooled together from the various
disciplines involved with this course.
This garnered brain trust will then help
me to think more creatively, logically,
and on a holistic scope when I undertake
current and future
project.
|
|
Institutional
Status
|
PhD
Graduate Student
|
|
Research
|
Molecular
Beam Epitaxy III-V Materials &
Photonic Device
|
|
|
MEMS Coupled Charge-Gap Lumped
Dynamic Modeling of a 1D
Cantilever
Stephen D. Senturia, Microsystem Design. Kluwer Academic
Publishers. Boston. 2001
Parameter
|
Symbol
|
Value
|
Area
|
A
|
100
|
Permittivity
|
e
|
1
|
Initial
Gap
|
go
|
1
|
Minimum
Gap
|
gmin
|
.01
|
Mass
|
m
|
1
|
Damping
Constant
|
b
|
0.5
|
Spring
Constant
|
k
|
1
|
Resistance
|
R
|
.001
|
|